Title:
レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP7140075
Kind Code:
B2
Abstract:
A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
Inventors:
Jun Hatakeyama
Masaki Ohashi
Noriyuki Fujiwara
Masaki Ohashi
Noriyuki Fujiwara
Application Number:
JP2019156290A
Publication Date:
September 21, 2022
Filing Date:
August 29, 2019
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; C07C381/12; C08F220/10; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2020015713A | ||||
| JP2018118962A | ||||
| JP2007178858A | ||||
| JP2000034274A |
Attorney, Agent or Firm:
Hideaki International Patent Office