レジスト材料及びパターン形成方法

Title:

レジスト材料及びパターン形成方法

Document Type and Number:

Japanese Patent JP7276180

Kind Code:

B2

Abstract:

A resist composition comprising a base polymer and a quencher in the form of a heterocyclic amine compound having a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

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Inventors:

Jun Hatakeyama
Masaki Ohashi
Noriyuki Fujiwara

Application Number:

JP2020012227A

Publication Date:

May 18, 2023

Filing Date:

January 29, 2020

Export Citation:

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Assignee:

Shin-Etsu Chemical Co., Ltd.

International Classes:

G03F7/004; C08F220/10; G03F7/039; G03F7/20

Domestic Patent References:

JP2017068259A
JP2017068252A
JP11052575A
JP2020118959A
JP2005309384A

Foreign References:

KR1020090072015A

Attorney, Agent or Firm:

Patent Attorney Corporation Eimei International Patent Office

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