Title:
レジストパターンコーティング剤及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP5251985
Kind Code:
B2
Abstract:
A resist pattern coating agent includes a hydroxyl group-containing resin, a solvent, and at least two compounds including at least two groups shown by a following formula (1), compounds including a group shown by a following formula (2), and compounds including a group shown by a following formula (4).
Inventors:
Masashi Hori
Tomohiro Mita
Fujiwara Koichi
Katsuhiko Hieda
Keiichi Yamaguchi
Tomohiro Kakizawa
Tomohiro Mita
Fujiwara Koichi
Katsuhiko Hieda
Keiichi Yamaguchi
Tomohiro Kakizawa
Application Number:
JP2010529818A
Publication Date:
July 31, 2013
Filing Date:
September 18, 2009
Export Citation:
Assignee:
JSR CORPORATION
International Classes:
G03F7/40
Domestic Patent References:
| JPH11283910A | 1999-10-15 | |||
| JP2004046060A | 2004-02-12 | |||
| JP2006307179A | 2006-11-09 | |||
| JP2009069817A | 2009-04-02 | |||
| JP2008083537A | 2008-04-10 | |||
| JPH11283910A | 1999-10-15 | |||
| JP2004046060A | 2004-02-12 | |||
| JP2006307179A | 2006-11-09 | |||
| JP2009069817A | 2009-04-02 | |||
| JP5116776A |
Attorney, Agent or Firm:
Ippei Watanabe
Koji Kikawa
Hiroyuki Sato
Shigeru Koike
Koji Kikawa
Hiroyuki Sato
Shigeru Koike