Title:
RESIST REMOVING AGENT
Document Type and Number:
Japanese Patent JPH0248668
Kind Code:
A
Abstract:
PURPOSE: To prevent the dissolution of metals such as Ni, Sn and Al by a resist removing agent by incorporating org. alkalis into the agent.
CONSTITUTION: A resist removing agent having a compsn. consisting of about 10-40wt.% phenol, 30-70wt.% alkylbenzenesulfonic acid, 5-30wt.%, in total, of chlorine-contg. org. compds. and 1-20wt.% org. alkali is used. Even when water enters the removing agent in a removing stage to form HCl, this HCl as the principal cause of dissolution is neutralized by the org. alkali and removed.
Inventors:
YANAGISAWA HIROSHI
IMAMURA YOSHINORI
IMAMURA YOSHINORI
Application Number:
JP19899888A
Publication Date:
February 19, 1990
Filing Date:
August 11, 1988
Export Citation:
Assignee:
AGENCY IND SCIENCE TECHN
International Classes:
G03F7/42; H01L21/027; H01L21/30; (IPC1-7): G03F7/42; H01L21/027
Next Patent: JPH0248669