Title:
RESIST RESIN
Document Type and Number:
Japanese Patent JP2018197326
Kind Code:
A
Abstract:
To provide a resist resin that shows improvements in residues during development and in adhesion.SOLUTION: The present invention provides a resist resin in which: a monomer (A) represented by formula (1) is 1-40 mol%; a monomer (B) having a carboxyl group is 5-40 mol%; another monomer (C) is 20-94 mol%; and the weight average molecular weight is 3,000-100,000 (X and Y are different to represent NH or O; Rand Rare H or alkyl; Ris alkyl).SELECTED DRAWING: None
Inventors:
YAMADA AKIHIRO
NAGASAWA ATSUSHI
NAGASAWA ATSUSHI
Application Number:
JP2017103241A
Publication Date:
December 13, 2018
Filing Date:
May 25, 2017
Export Citation:
Assignee:
NOF CORP
International Classes:
G03F7/033; C08F246/00
Domestic Patent References:
| JP2002357901A | 2002-12-13 | |||
| JP2004317659A | 2004-11-11 |
Attorney, Agent or Firm:
Masumi Hosoda
Juno Aoki
Juno Aoki