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Title:
レジスト下層膜形成材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP5653880
Kind Code:
B2
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Inventors:
畠山 潤
郡 大佑
荻原 勤
Application Number:
JP2011224290A
Publication Date:
January 14, 2015
Filing Date:
October 11, 2011
Export Citation:
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Assignee:
信越化学工業株式会社
International Classes:
G03F7/11; C08G8/20; G03F7/26; H01L21/027
Attorney, Agent or Firm:
Good Miya Mikio



 
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