Title:
後退装置と、それを有するフィード機構
Document Type and Number:
Japanese Patent JP7271542
Kind Code:
B2
Abstract:
A retraction device (100) includes: a spindle (10), a support plate (20) and a plurality of spring washers (30). The spindle is movable along an axis direction thereof and has a first end; a support plate has a fixed position, the first end of the spindle penetrates the support plate; and the plurality of spring washers are fitted over the first end of the spindle and stacked together in an identical direction. The plurality of spring washers are compressed between the spindle and the support plate with a predetermined pre-load. The spindle is configured to be switchable between a first position and a second position, and capable of moving a predetermined distance relative to the support plate in the axis direction of the spindle during switching. When in the first position, the spindle is farthest from the support plate, when in the second position, the spindle is closest to the support plate. A feeding mechanism (1000) is also disclosed. The retraction device enhances the rigidity of the feeding mechanism and improves the quality of the section.
Inventors:
Fan, Zeguan
Lian, Shan
Jou, Gun
Lian, Shan
Jou, Gun
Application Number:
JP2020528006A
Publication Date:
May 11, 2023
Filing Date:
November 27, 2018
Export Citation:
Assignee:
Leica Microsystems Ltd. Shanghai
International Classes:
G01N1/06
Domestic Patent References:
| JP60192236A |
Foreign References:
| US3534647 |
Attorney, Agent or Firm:
Asamichi Kato
Kiyoto Uchida
Kiyoto Uchida