To provide a rinsing tank for rinsing a work with a ultra-clean liquid.

A rinsing tank is equipped with a rinsing chamber demarcated with a case. The case is provided with an overflow discharge, opening at its upper part and equipped with a diffusion device having a porous base plate, connected to a first pressurized cleaning liquid supply system. Injection nozzles or injectors, connected to a second pressurized cleaning liquid supply system, are provided around the porous base plate of the diffusion device. A flow of rinse ejected from the injector causes liquid, which is designed to remove contaminants or molecules from the surface of a substrate, to circulate downwardly. A hydraulic piston effect produced by the first supply system connected to the porous base plate lifts up rinsing liquid toward the overflow discharge opening. This rinsing tank is used for rinsing semiconductors, micro systems, and works of silicon, quartz, germanium, glass or the like used for a flat screen industry.