RUTHENIUM COMPOUND, AND METHOD OF FORMING METALLIC RUTHENIUM FILM

Title:

RUTHENIUM COMPOUND, AND METHOD OF FORMING METALLIC RUTHENIUM FILM

Document Type and Number:

Japanese Patent JP2005060814

Kind Code:

A

Abstract:

To provide a ruthenium compound from which film-like metallic ruthenium of high quality can be obtained, and to provide a method of forming a metallic ruthenium film by a chemical vapor deposition method using the same.

The ruthenium compound as a chemical vapor deposition material is, e.g. expressed by formula (1).

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Inventors:

SAKAI TATSUYA
OKADA SACHIKO
MATSUKI YASUO

Application Number:

JP2003318133A

Publication Date:

March 10, 2005

Filing Date:

September 10, 2003

Export Citation:

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Assignee:

JSR CORP

International Classes:

C07C11/12; C07C13/263; C07C22/02; C07C53/126; C07F7/08; C07F15/00; C07F17/02; C07F19/00; C23C16/18; H01L21/285; (IPC1-7): C23C16/18; C07C11/12; C07C13/263; C07C22/02; C07C53/126; C07F19/00; H01L21/285

Attorney, Agent or Firm:

Masataka Oshima

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