Title:
SALICYLATED ARALKYL RESIN, PROCESS FOR PRODUCING THE SAME, AND PHOTORESIST RESIN COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP3654714
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a photoresist resin compsn. having a high resolution and a high sensitivity by using a specified salicylated aralkyl resin as an alkali- soluble component.
SOLUTION: This resin is represented by formula 1 (wherein X represents either a salicylic acid residue A or a spirobiindanediphenol residue B of formula 2; the molar ratio of A to B is 99/1 to 50/50; and m represents an integer of 0 to 100). This resin is prepd. by polycondensing methyl salicylate with a spirobiindanediphenol of the formula 2 in the presence of an acid catalyst and an aralkyl alcohol derivative of formula 3 (wherein R1 represents a hydroxyl group, a lower alkoxy group having 4 or less carbon atoms or a halogen atom) or an alkyl halide as a condensing agent, distilling off unreacted methyl salicylate, and hydrolyzing the resin ester thus obtained with an alkali.
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Inventors:
Tatsunobu Urakami
Atsuo Otsuji
Keizaburo Yamaguchi
Keisuke Takuma
Atsuo Otsuji
Keizaburo Yamaguchi
Keisuke Takuma
Application Number:
JP17329096A
Publication Date:
June 02, 2005
Filing Date:
July 03, 1996
Export Citation:
Assignee:
Mitsui Chemicals, Inc.
International Classes:
C08K5/053; C08G61/00; C08G61/02; C08K5/09; C08L61/04; C08L61/06; C08L65/00; G03F7/039; (IPC1-7): C08G61/02; C08K5/053; C08K5/09; C08L61/06; C08L65/00; G03F7/039
Domestic Patent References:
| JP8053538A | ||||
| JP6211742A | ||||
| JP8333441A |
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