SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Japanese Patent JP2023143844

A

To provide a salt which allows a resist pattern having good resolution to be produced, an acid generator, a resin, and a resist composition containing the same.SOLUTION: There are provided: a salt represented by formula (I); an acid generator; a resin containing a specific structural unit; and a resist composition containing the same. [R1 and R2 each represent a hydroxy group, -O-R10 or the like; R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group or the like; R10 represents an acid-labile group; A1 and A2 each represent a hydrocarbon group; m1 represents an integer of 1-5; m2 and m8 represent integers of 0-5; m4, m5 and m7 represent integers of 0-4; 1≤m1+m7≤5; and 0≤m2+m8≤5.]SELECTED DRAWING: None

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SHIMADA MASAHIKO
ICHIKAWA KOJI

JP2023045416A

October 06, 2023

March 22, 2023

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SUMITOMO CHEMICAL CO

G03F7/004; C07C43/225; C07C43/29; C07C69/712; C07C309/12; C07C309/17; C08F20/38; C08F212/14; C08F220/10; C09K3/00; G03F7/038; G03F7/039; G03F7/20

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