Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021138684
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU) and a resist composition containing the same.SOLUTION: There are provided: a salt represented by formula (I); and an acid generator and a resist composition containing the salt. [In the formula, Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R1 and R2 each represent a hydrogen atom, a fluorine atom or the like; z represents an integer of 0-6; X1 represents *-CO-O-, *-O-CO-, *-O- or *-O-CO-O-; * represents a binding site; L1 represents a single bond or an optionally substituted hydrocarbon group; R3 and R4 each represent a hydrogen atom or an acid-labile group and may combine to form a group having an acetal ring structure; R5 represents a halogen atom, a fluorinated alkyl group or an alkyl group; n represents an integer of 0-3; and Z+ represents an organic cation.]SELECTED DRAWING: None
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Inventors:
KITA YUJI
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2021004394A
Publication Date:
September 16, 2021
Filing Date:
January 14, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C309/17; C07C381/12; C07D307/00; C07D317/64; C07D493/08; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation