Title:
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022008152
Kind Code:
A
Abstract:
To provide a salt, an acid generator and a resist composition comprising the same, making it possible to produce a resist pattern having excellent CD uniformity (CDU).SOLUTION: The present invention discloses a dibenzothiophenium salt or the like having a specific structure with a specific counter anion, produced from compounds illustrated by the following formulae, and a resist composition containing the same.SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2021096169A
Publication Date:
January 13, 2022
Filing Date:
June 08, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D333/76; C07D307/00; C07D321/10; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation