SALT, ACID GENERATOR, RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN

Title:

SALT, ACID GENERATOR, RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN

Document Type and Number:

Japanese Patent JP2022013736

Kind Code:

A

Abstract:

To provide a salt, an acid generator and a resist composition including the same that enable production of a resist pattern with excellent CD uniformity (CDU).SOLUTION: Provided are a dibenzothiophenium salt having a specific structure exemplified by a structural formula (I-8), and a resist composition including the same.SELECTED DRAWING: None

Inventors:

KOMURO KATSUHIRO
ICHIKAWA KOJI

Application Number:

JP2021096173A

Publication Date:

January 18, 2022

Filing Date:

June 08, 2021

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

C07D333/76; C07D307/00; C07D321/10; C07D409/12; C07D493/04; G03F7/004; G03F7/038; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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