Title:
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022021311
Kind Code:
A
Abstract:
To provide a salt that makes it possible to produce a resist pattern having excellent CD uniformity, an acid generator and a resist composition comprising the same.SOLUTION: The present invention discloses, for example, a salt represented by formula (I-8), an acid generator and a resist composition comprising the same.SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
SAITO MARINA
ICHIKAWA KOJI
SAITO MARINA
ICHIKAWA KOJI
Application Number:
JP2021114280A
Publication Date:
February 02, 2022
Filing Date:
July 09, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D333/76; C07D307/00; C07D321/10; C08F20/10; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation