SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Title:

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2022025005

Kind Code:

A

Abstract:

To provide a salt that can produce a resist pattern having excellent pattern collapse resistance (PCM), an acid generator and a resist composition comprising the same.SOLUTION: The present invention discloses a salt of formula (I), a generator and a resist composition.SELECTED DRAWING: None

Inventors:

KOMURO KATSUHIRO
KATSURA NATSUKI
ICHIKAWA KOJI

Application Number:

JP2021103273A

Publication Date:

February 09, 2022

Filing Date:

June 22, 2021

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

C07D333/76; C07D307/00; C07D321/10; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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