Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022073968
Kind Code:
A
Abstract:
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good line edge roughness (LER) to be produced.SOLUTION: The salt is represented by formula (I) [where Q1 and Q2 each independently represent a fluorine atom, a C1-6 perfluoroalkyl group or the like; R11 and R12 each independently represent a hydrogen atom, a fluorine atom, a C1-6 perfluoroalkyl group or the like; z represents an integer of 0-6; X0 represents *-CO-O-, *-O-CO-, *-O-CO-O- or the like; L1 represents a single bond or an optionally substituted C1-28 hydrocarbon group, provided that -CH2- in the group may be substituted with -O-, -S-, -SO2- or -CO-; R1 represents an optionally substituted C3-18 cyclic hydrocarbon group; m represents an integer of 1-4; and Z+ represents an organic cation].SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2021150097A
Publication Date:
May 17, 2022
Filing Date:
September 15, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C309/17; C07C381/12; C07D307/00; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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