Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022091718
Kind Code:
A
Abstract:
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.SOLUTION: The salt represented by formula (I), the acid generator, and the resist composition containing the same are provided. [In the formula, Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R11 and R12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0-6; X1 represents *-CO-O-, *-O-CO- or the like; L1 represents a single bond or an optionally substituted hydrocarbon group; X2 represents -O- or -S-; R1 represents a halogen atom or a haloalkyl group; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer of 0-2; and Z+ represents an organic cation.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
FUJITA SHINGO
ICHIKAWA KOJI
FUJITA SHINGO
ICHIKAWA KOJI
Application Number:
JP2021197983A
Publication Date:
June 21, 2022
Filing Date:
December 06, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D307/56; C07C381/12; C07D307/68; C07D333/40; C07D407/12; C09K3/00; G03F7/004; G03F7/038; G03F7/039
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
Previous Patent: JPWO2022091717
Next Patent: Information processing methods, programs and information processing equipment
Next Patent: Information processing methods, programs and information processing equipment