Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022093297
Kind Code:
A
Abstract:
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.SOLUTION: The salt represented by formula (I), the acid generator, and the resist composition are provided. [In the formula, Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R11 and R12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0-6; X1 represents *-CO-O-, *-O-CO- or the like; L1 represents a single bond or an optionally substituted hydrocarbon group; Xa and Xb each represent -O- or -S-; a ring W1 represents an optionally substituted alicyclic hydrocarbon group; a ring W represents an optionally substituted aromatic hydrocarbon group; R1 and R2 each represent a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m1 and m2 each represent an integer of 0-6; and Z+ represents an organic cation.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
NAKAGAWA TAKUYA
ICHIKAWA KOJI
NAKAGAWA TAKUYA
ICHIKAWA KOJI
Application Number:
JP2021198246A
Publication Date:
June 23, 2022
Filing Date:
December 07, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D317/72; C07C381/12; C08F212/04; C08F220/12; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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