SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2022123839

Kind Code:

A

Abstract:

To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good line edge roughness (LER) to be produced.SOLUTION: There are provided: a triphenyl salt having substituents which is represented by a specific formula; an acid generator; and a resist composition containing the same.SELECTED DRAWING: None

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Inventors:

KOMURO KATSUHIRO
OGUMA JUN
ICHIKAWA KOJI

Application Number:

JP2022011562A

Publication Date:

August 24, 2022

Filing Date:

January 28, 2022

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/004; C07C381/12; C07D307/00; C07D321/10; C09K3/00; G03F7/038; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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