Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022161017
Kind Code:
A
Abstract:
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.SOLUTION: There are provided a salt represented by formula (I), an acid generator, and a resist composition containing the same. [In the formula, Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R11 and R12 each represent a hydrogen atom, a fluorine atom or the like; X1 and X2 each represent *-CO-O-, *-O-CO- or the like; L1 represents a single bond, an optionally substituted hydrocarbon group or the like; ring W represents an alicyclic hydrocarbon group; R1 represents a halogen atom, a hydroxy group or the like; L4 represents a single bond or an alkanediyl group; R2 represents a group represented by formula (1a) or the like; Z+ represents an organic cation; and Raa1, Raa2 and Raa3 each represent an alkyl group or the like, or Raa1 and Raa2 are bonded to each other to form an alicyclic hydrocarbon group together with a carbon atom to which they are bonded.]SELECTED DRAWING: None
Inventors:
NAKAGAWA TAKUYA
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2022056649A
Publication Date:
October 20, 2022
Filing Date:
March 30, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C09K3/00; C07C25/18; C07C309/17; C07C381/12; C07D333/76; C08F220/18; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation