Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023109733
Kind Code:
A
Abstract:
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.SOLUTION: There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formula, R1, R2 and R3 each represent an optionally substituted naphthalene, an optionally substituted anthracene or an optionally substituted phenanthrene; A1, A2 and A3 each represent a hydrocarbon group; at least one of m1, m2 and m3 represents an integer of 1 or more; and AI- represents an organic anion.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
TERAHIGASHI SHOHEI
ICHIKAWA KOJI
TERAHIGASHI SHOHEI
ICHIKAWA KOJI
Application Number:
JP2023010454A
Publication Date:
August 08, 2023
Filing Date:
January 26, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C309/06; C07D307/00; C07D321/10; C07D333/76; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP