Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023171386
Kind Code:
A
Abstract:
To provide a salt, a resist composition, and the like which allow a resist pattern having good line edge roughness to be produced.SOLUTION: The salt is represented by formula (I) [where Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R1 and R2 each represent a hydrogen atom, a fluorine atom or the like; z represents an integer of 0-6; X1 represents *-CO-O-, *-O-CO- or the like; L1 represents a group formed by combining an alkanediyl group and an alicyclic saturated hydrocarbon group; A1 represents a divalent alicyclic hydrocarbon group which may have a halogen atom, a hydroxy group or the like; Ra represents a perfluoroalkyl group; Z+ represents a cation represented by formula (b2-1) or the like; and Rb4-Rb6 each represent a chain hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group].SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
YAMAMOTO SATOSHI
ICHIKAWA KOJI
YAMAMOTO SATOSHI
ICHIKAWA KOJI
Application Number:
JP2023148715A
Publication Date:
December 01, 2023
Filing Date:
September 13, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C309/17; C07C381/12; C07D327/06; C07D333/02; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP
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