SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023177294

Kind Code:

A

Abstract:

To provide a salt, a resist composition and the like which allow a resist pattern having good line edge roughness to be produced.SOLUTION: There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formula, Ar1, Ar2 and Ar3 each independently represent naphthalene, anthracene or phenanthrene; R1, R2 and R3 each represent -O-R10, -O-CO-R10 or the like; and R10 represents a base-labile group.]SELECTED DRAWING: None

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Inventors:

NAKAMURA HIROMU
NOZU SHUNTA
ICHIKAWA KOJI

Application Number:

JP2023086936A

Publication Date:

December 13, 2023

Filing Date:

May 26, 2023

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/004; C07C309/58; C07C381/12; C07D307/00; C07D307/33; C07D321/10; C07D327/06; C07D327/08; C07D333/46; C07D333/76; C07D335/02; C07D493/10; C07D493/20; C09K3/00; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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