Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023180234
Kind Code:
A
Abstract:
To provide a salt, a resist composition and the like which enable manufacture of a resist pattern having good CD uniformity.SOLUTION: There are provided a salt represented by formula (I), an acid generator, and a resist composition containing the same, (wherein, Q1, Q2, Q3 and Q4 each represent a hydrogen atom, a fluorine atom, an alkyl group or a perfluoroalkyl group; L1, L2 and L3 each represent a hydrocarbon group that may have a substituent; W1 represents a non-aromatic hydrocarbon ring that may have a substituent; W2 represents a non-aromatic hydrocarbon ring that may have a substituent or an aromatic hydrocarbon ring that may have a substituent; Xa and Xb each represent an oxygen atom or a sulfur atom; X1 represents a saturated hydrocarbon group; and Z1+ and Z2+ each represent an organic cation.)SELECTED DRAWING: None
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Inventors:
KOMURO KATSUHIRO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2023093396A
Publication Date:
December 20, 2023
Filing Date:
June 06, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07D319/08; C07D407/12; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP