Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7124340
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), and a resist composition containing the salt.SOLUTION: The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or a C1-6 perfluoroalkyl group; Rand Reach independently represent a hydrogen atom, a fluorine atom, or a C1-6 perfluoroalkyl group; z represents an integer of 0-6; Xrepresents -CO-O-, -O-CO-, or the like; Lrepresents a single bond, a C1-24 divalent saturated hydrocarbon group, or the like; Rand Reach independently represent an optionally substituted C3-24 alicyclic hydrocarbon group or the like; p and q each independently represent an integer of 0-3; and Zrepresents an organic cation].SELECTED DRAWING: None
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Inventors:
Yukako Adachi
Yamaguchi Norifumi
Koji Ichikawa
Yamaguchi Norifumi
Koji Ichikawa
Application Number:
JP2018034371A
Publication Date:
August 24, 2022
Filing Date:
February 28, 2018
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07C381/12; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013174857A | ||||
| JP2015131804A | ||||
| JP2013147485A | ||||
| JP2017095447A | ||||
| JP6850597B2 |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto
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