Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7135456
Kind Code:
B2
Abstract:
To provide a salt used for a resist composition capable of producing a resist pattern with good line edge roughness (LER).SOLUTION: The salt is represented by formula (I). [Qand Qeach independently represent a fluorine atom or the like; Rand Reach independently represent H or the like; z represents an integer of 0-6; when z is 2 or more, a plurality of R's and R's may be the same as or different from each other; Xrepresents *-CO-O- or the like (* represents a bond with C(R)(R) or C(Q)(Q)); Lrepresents a C1-36 divalent hydrocarbon group having a fluorine atom, or the like; Rrepresents an optionally substituted C1-24 hydrocarbon group or the like; and Zrepresents an organic cation.]SELECTED DRAWING: None
Inventors:
Yukako Adachi
Yamaguchi Norifumi
Koji Ichikawa
Yamaguchi Norifumi
Koji Ichikawa
Application Number:
JP2018107458A
Publication Date:
September 13, 2022
Filing Date:
June 05, 2018
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07C321/30; C07D307/00; C07D313/10; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2016130239A | ||||
| JP2015025829A | ||||
| JP2011121937A | ||||
| JP2011006401A | ||||
| JP2012136507A | ||||
| JP2012193170A |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto