Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7199291
Kind Code:
B2
Abstract:
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).SOLUTION: The salt is represented by formula (I), and the resist composition contains the salt. [In the formula, each of Rand Rrepresents a halogen atom or a perfluoroalkyl group; m3 represents an integer among 0-3; Rrepresents a halogen atom, a fluorinated alkyl group or an alkyl group, provided that -CH- contained in the alkyl group may be substituted with -O- or -CO-; each of m4 and m5 independently represents an integer of 0-3; each of Rand Rrepresents a hydrogen atom, a hydroxy group or a hydrocarbon group, provided that -CH- contained in the hydrocarbon group may be substituted with -O-, -CO- or the like and Rand Rmay be bonded to each other to form an aliphatic ring; X represents a single bond, -CH-, -C(=O)-, -O- or -S-; and AIrepresents an organic anion.]SELECTED DRAWING: None
Inventors:
Yukako Adachi
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2019074264A
Publication Date:
January 05, 2023
Filing Date:
April 09, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D327/06; C07C309/12; C07C309/17; C07D321/10; C07D333/46; C08F220/16; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2017155036A | ||||
| JP2017111206A | ||||
| JP2014235248A | ||||
| JP2005115016A | ||||
| JP2019085396A | ||||
| JP49025265B1 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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