Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7249093
Kind Code:
B2
Abstract:
To provide a salt capable of producing a resist pattern with a good mask error factor (MEF) and a resist composition containing the salt.SOLUTION: The salt has an anion represented by formula (aa2) [where Xa and Xb each independently represent an oxygen atom or a sulfur atom; ring W represents a heterocyclic ring represented by formula (W-1) or the like; a hydrogen atom contained in the heterocyclic ring may be substituted with a hydroxy group or the like; ring W1 represents a ring represented by formula (w1-1) or the like; Lb1 represents a group represented by formula (b1-1) or the like; and Q1 and Q2 each independently represent a fluorine atom or a C1-6 perfluoroalkyl group].SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Natsuki Okada
Koji Ichikawa
Natsuki Okada
Koji Ichikawa
Application Number:
JP2017028734A
Publication Date:
March 30, 2023
Filing Date:
February 20, 2017
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D493/10; C07D327/06; C07D493/20; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2014224984A |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto
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