Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7317602
Kind Code:
B2
Abstract:
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the salt.SOLUTION: The salt represented by formula (I) and the resist composition are provided. [In the formula, Rrepresents a hydrogen atom or an alkyl group and Rrepresents an alkyl group, provided that Rand Rrepresent different alkyl groups when Ris an alkyl group, and -CHRRrepresents a branched alkyl group when Ris a hydrogen atom; Rrepresents a halogen atom, a fluorinated alkyl group or an alkyl group; m3 represents an integer of 0-4; Rand Reach represent a hydrogen atom, a hydroxy group or a hydrocarbon group; m4 and m5 each represent an integer of 1-3; X represents a single bond, -CH-, -CO-, -O- or -S-; and AIrepresents an organic anion.]SELECTED DRAWING: None
Inventors:
Yukako Adachi
▲高▼橋 優樹
Koji Ichikawa
▲高▼橋 優樹
Koji Ichikawa
Application Number:
JP2019126953A
Publication Date:
July 31, 2023
Filing Date:
July 08, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D327/06; C07D335/02; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2018138541A | ||||
| JP2017057192A | ||||
| JP2017207737A | ||||
| JP2012137557A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP
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