Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7373307
Kind Code:
B2
Abstract:
A salt capable of producing a resist pattern with excellent line edge roughness is represented by formula (I):wherein, R1 represents —(X1—O)o—R5, and o represents an integer of 0 to 6, R5 represents a hydrocarbon group having 1 to 12 carbon atoms, X1 represents a divalent hydrocarbon group having 2 to 12 carbon atoms, R2 represents an alkyl group having 1 to 12 carbon atoms or the like, I represents an integer of 0 to 3, and when I is 2 or more, a plurality of R2 may be the same or different from each other, R3 and R4 each represent a hydrogen atom or the like, m and n each represent 1 or 2, X0 represents a single bond, —CH2—, —O— or —S—, and R6 and R7 each represent an alkyl group having 1 to 4 carbon atoms which has a fluorine atom or the like.
Inventors:
Yukako Adachi
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2019110195A
Publication Date:
November 02, 2023
Filing Date:
June 13, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D327/06; C07C311/48; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2014178645A | ||||
| JP2012008369A | ||||
| JP2011141494A | ||||
| JP2011053360A | ||||
| JP2006258925A | ||||
| JP2007327983A | ||||
| JP2007065353A | ||||
| JP2014215549A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP