塩およびこれを含むフォトレジスト - Rohm and Haas Electronic Materials LLC

Title:

塩およびこれを含むフォトレジスト

Document Type and Number:

Japanese Patent JP7011999

Kind Code:

B2

Abstract:

New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.

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Inventors:

Imad Acad
James F Cameron
James W. Sackray

Application Number:

JP2018207968A

Publication Date:

February 10, 2022

Filing Date:

November 05, 2018

Export Citation:

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Assignee:

Rohm and Haas Electronic Materials LLC

International Classes:

G03F7/004; C08F30/00; G03F7/20

Domestic Patent References:

JP2001255647A
JP61084642A
JP2017197489A
JP60175046A

Other References:

Chemistry - A European Journal ,2004年,10(10),p.2590-2600
Tetrahedron Letters,1995年,36(16),p.2803-2806
Zeitschrift fuer Anorganische und Allgemeine Chemie ,2002年,628(4),p.833-842
Chemistry Letters,2002年,(3),p.288-289

Attorney, Agent or Firm:

Patent Business Corporation Sender International Patent Office

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