Title:
SALT, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020173436
Kind Code:
A
Abstract:
To provide a salt and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).SOLUTION: The resist composition contains: a resin containing a structural unit represented by formula (a2-A) and a structural unit having an acid-labile group; and a salt represented by formula (I). [In the formula (a2-A), Ra50 represents a hydrogen atom, a halogen atom or the like; and Ra51 represents a halogen atom, a hydroxy group or an alkyl group.]SELECTED DRAWING: None
Inventors:
ADACHI YUKAKO
NAKAMURA HIROMU
ICHIKAWA KOJI
NAKAMURA HIROMU
ICHIKAWA KOJI
Application Number:
JP2020062910A
Publication Date:
October 22, 2020
Filing Date:
March 31, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/039; C07C309/58; C07D327/06; C07D333/06; C07D335/02; C08F214/14; C08F216/14; C08F218/04; C08F220/12; C09K3/00; G03F7/004; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation