To solve the following problem: a conventional resist composition containing an acid generator cannot always satisfy the line edge roughness (LER) of an obtained pattern.
There is provided a salt represented by formula (I) wherein: Q1 and Q2 each independently denote a fluorine atom or a 1-6C perfluoroalkyl group; L1 denotes a divalent 1-17C saturated hydrocarbon group, and a methylene group constituting the saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group; a ring W denotes a 4-36C aliphatic ring, and a methylene group constituting the aliphatic ring may be replaced with an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group; A1 denotes a methylene group or an ethylene group; R1 denotes a 1-12C hydrocarbon group or a 2-12C acyl group; and Z+ denotes an organic cation.
OCHIAI MITSUYOSHI
NISHIMURA TAKASHI
Toru Sakamoto
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