SALT AND RESIST COMPOSITION - SUMITOMO CHEMICAL CO

Title:

SALT AND RESIST COMPOSITION

Document Type and Number:

Japanese Patent JP2013060424

Kind Code:

A

Abstract:

To provide a resist composition that can produce resist patterns with excellent resolution.

This resist composition includes a resin insoluble or hardly soluble in an alkaline aqueous solution, but soluble in the alkaline solution by the action of an acid, and a salt expressed by formula (I). In the formula (I), Q¹ and Q² are the same or different, each represents F or a perfluoroalkyl group; L¹ represents a single bond or a divalent aliphatic saturated hydrocarbon group, where H contained in the divalent aliphatic saturated hydrocarbon group may be replaced with F or a hydroxy group, a methylene group constituting the divalent aliphatic saturated hydrocarbon group may be replaced with O or the like; R¹ represents a hydrocarbon group or the like; R² represents H or an alkyl group; m denotes an integer of 0-4; and Z⁺ represents an organic cation.

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Inventors:

SAKAMOTO HIROSHI
KAMABUCHI AKIRA
ICHIKAWA KOJI

Application Number:

JP2012180783A

Publication Date:

April 04, 2013

Filing Date:

August 17, 2012

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

C07D311/16; C08F22/12; G03F7/004; G03F7/039; C07D307/93; C07D327/06

Attorney, Agent or Firm:

Toru Nakayama
Toru Sakamoto

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