Title:
撮像のための試料調製方法
Document Type and Number:
Japanese Patent JP5925182
Kind Code:
B2
Abstract:
A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.
Inventors:
Michael schmidt
Jeff Blackwood
Stacy stone
Sun Hoon Lee
Ronald Kelly
Jeff Blackwood
Stacy stone
Sun Hoon Lee
Ronald Kelly
Application Number:
JP2013268368A
Publication Date:
May 25, 2016
Filing Date:
December 26, 2013
Export Citation:
Assignee:
FEI COMPANY
International Classes:
G01N23/225; G01N23/04; H01J37/317
Domestic Patent References:
| JP2012252004A | ||||
| JP2010230518A | ||||
| JP2004361140A | ||||
| JP2004164966A |
Foreign References:
| US6188068 |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Shinsuke Onuki
Tadahiko Ito
Shinsuke Onuki
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