Title:
マイクロレンズアレイを使用したスキャン露光装置
Document Type and Number:
Japanese Patent JP5515120
Kind Code:
B2
Abstract:
A microlens array is a stacked body of four unit microlens arrays, and the optical axis of a portion of the unit microlens arrays can be shifted from the optical axis of the other unit microlens arrays. In a scanning exposure apparatus, a CCD line camera detects an image on a substrate, and using a first-layer pattern on the substrate as a reference pattern, in a case in which a mask exposure pattern does not match the reference pattern, shifts the optical axis of the microlenses to adjust the magnification of a projection pattern using the microlens array. This makes it possible to adjust the exposure position using the microlens array so that even when the exposure pattern deviates from the reference pattern, the deviation can be detected during exposure and an exposure pattern misregistration can be prevented, enabling the precision of the exposure pattern to be enhanced in an overlay exposure.
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Inventors:
Mizumura Tsushin
Makoto Hatanaka
Makoto Hatanaka
Application Number:
JP2010244697A
Publication Date:
June 11, 2014
Filing Date:
October 29, 2010
Export Citation:
Assignee:
Buoy Technology Co., Ltd.
International Classes:
G03F7/20; H01L21/027
Domestic Patent References:
| JP2001521278A | ||||
| JP200752214A | ||||
| JP2007279113A | ||||
| JP2006502558A |
Attorney, Agent or Firm:
Masanori Fujimaki