Title:
走査電子顕微鏡及びパタン計測方法
Document Type and Number:
Japanese Patent JP7149906
Kind Code:
B2
Abstract:
A scanning electron microscope includes an electron-optical system including an electron source and an objective lens, a stage on which a sample is placed, a secondary electron detector disposed adjacent to the electron source relative to the objective lens and configured to detect secondary electrons, a backscattered electron detector disposed between the objective lens and the stage and configured to detect backscattered electrons, a backscattered electron detection system controller configured to apply a voltage to the backscattered electron detector, and a device-control computer configured to detect a state of an electrical charge carried by the backscattered electron detector based on signal intensity at the secondary electron detector when the primary electrons are applied to the sample with a predetermined voltage applied to the backscattered electron detector.
Inventors:
Takeyoshi Ohashi
Yusuke Abe
Kenji Tanimoto
Kaori Bizen
Kim Rie Makoto
Yusuke Abe
Kenji Tanimoto
Kaori Bizen
Kim Rie Makoto
Application Number:
JP2019145363A
Publication Date:
October 07, 2022
Filing Date:
August 07, 2019
Export Citation:
Assignee:
Hitachi High-Tech Co., Ltd.
International Classes:
H01J37/244; H01J37/28; H01L21/66
Domestic Patent References:
| JP2009105037A |
Foreign References:
| WO2015163036A1 |
Attorney, Agent or Firm:
Polar Patent Attorney Corporation