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Patent Searching and Data


Title:
SCANNING ELECTRON MICROSCOPE
Document Type and Number:
Japanese Patent JPH06181041
Kind Code:
A
Abstract:

PURPOSE: To provide a scanning electron microscope in which the yield of a secondary electron can be increased up to 100% and also aberration can be reduced, thereby making it feasible to perform observation with high resolution.

CONSTITUTION: A primary electron beam 1 passes through a deflection coil 7 and then is throw on a sample 3. At that time, a magnetic field made by an objective lens is spread over the sample 3 and the upper space and the primary electron beam 1 is focused to a degree of being several nm in diameter. With the primary electron beam thrown on the sample 3, a secondary electron 2 is emitted from the sample 3 with angular distribution. Since the energy of secondary electron 2 is as low as several eV, the secondary electron 2 is twisted about the magnetic flux of the objective lens 5 to go up as it is making spiral motion. The magnetic flux density abruptly goes down apart from the direction of the sample, and the secondary electron is shaked off from the spiral motion to evaporate and then is deflected with the attracting electric field from a secondary electron detector 4 and is caught by the secondary electron detector 4.


Inventors:
OSE YOICHI
HIGUCHI YOSHIYA
YOSHINARI KIYOMI
Application Number:
JP33408892A
Publication Date:
June 28, 1994
Filing Date:
December 15, 1992
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
H01J37/141; H01J37/28; (IPC1-7): H01J37/141; H01J37/28
Attorney, Agent or Firm:
Ogawa Katsuo