To provide a scanning exposure device which enables a wide angle projection optical system and a high resolution projection optical system jointly.
In a low NA optical system which covers the center of a mask 1, illuminating light from a photomask 1 exits light through a first reflection optical system which consists of a trapezoid reflective mirror 3a, a concave mirror 5a and a concave mirror 4a and exits light through a second reflection optical system which consists of a trapezoid reflective mirror 3b, a concave mirror 5b and a concave mirror 4b, and an erect unmagnified real image is formed on a substrate 2. A high NA optical system which covers left and right of the mask 1 is disposed on the rear side of the scanning direction of the mask 1 and the substrate 2 and the central optical system is disposed on the front side thereof. Therein, the arrangement of the optical system can be reversed back and forth. The left and right optical systems are constituted in such a manner that the reflective optical systems are disposed in two-stage and, in addition, aspheric lenses 6a-6d and 11a-11d are added thereto. 8a-8d indicate meniscus aspheric lenses.
