PURPOSE: To facilitate observation by removing the strain and the blur of an image by using a circuit which rotates in the direction of beam scanning, a circuit which independently varies the vertical multiplying factor and the horizontal multiplying factor and a circuit for adding the lens current to the deflecting current.
CONSTITUTION: In a scanning-type reflected-electron-diffracting microscope, an electron beam 1 is converged on a sample 2 with a projection angle (θ) of at most 5° and scanned by deflecting coils 9 and 10 to produce an absorption current image on a CRT11 thereby selecting an area of the sample 2 to be analyzed. And, a reflected-electron diffraction image is formed on a screen 13 by irradiating a beam 1 on the area. This microscope is provided with the combination of a circuit 17 which performs image rotation, a circuit 18 which has the function of independently varying the X multiplying factor and the Y multiplying factor, and a collector 20 which performs dynamic focusing. Therefore, the distribution of the structures of crystals existing in the surface of the sample can be observed with high accuracy by removing the strain and the blur of an image caused due to the small projection angle of the electron beam 1.
HAYAKAWA KAZUNOBU
JPS5510212U | 1980-01-23 | |||
JPS5011761A | 1975-02-06 | |||
JPS4913903A | 1974-02-06 | |||
JPS4327726Y1 | 1968-11-15 |