Title:
堆積膜形成装置および堆積膜形成方法
Document Type and Number:
Japanese Patent JP7028730
Kind Code:
B2
Abstract:
To improve efficiency of deposition film forming, and to suppress film defect generation in a deposition film by suppressing peel-off generation from a dummy base body.SOLUTION: A deposition film forming device 100 includes: a deposition chamber 20 which accommodates a cylindrical base body 10A in which dummy base bodies D are arranged in upper and lower sides; an electrode 21 for creating plasma by discharging in the discharge space, the electrode arranged surrounding the dummy base body D and the cylindrical base body 10A; material gas introduction means for introducing material gas into the discharge space, and an outer surface of the dummy base body D comprises a dielectric body. As discharging becomes strong in a region corresponding to the base body 10A, film forming efficiency of the deposition film to the base body 10A is improved. As discharging becomes weak in a region corresponding to the dummy base body D, peel-off generation from the dummy base body D is suppressed, and film defect generation such as spherical type projection in the deposition film is suppressed.SELECTED DRAWING: Figure 1
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Inventors:
Yoshiaki Fujiwara
Application Number:
JP2018121824A
Publication Date:
March 02, 2022
Filing Date:
June 27, 2018
Export Citation:
Assignee:
Kyocera Corporation
International Classes:
C23C16/458; C23C16/24; C23C16/42; G03G5/08; H01L21/205
Domestic Patent References:
| JP60086277A | ||||
| JP2277777A | ||||
| JP2016132812A | ||||
| JP2014026101A | ||||
| JP2010171343A |