Title:
光学的測定のためのモデルとパラメータの選択
Document Type and Number:
Japanese Patent JP2005534192
Kind Code:
A
Abstract:
A profile model for use in optical metrology of structures in a wafer is selected, the profile model having a set of geometric parameters associated with the dimensions of the structure. The set of geometric parameters is selected to a set of optimization parameters. The number of optimization parameters within the set of optimization parameters is less than the number of geometric parameters within the set of geometric parameters. A set of selected optimization parameters is selected from the set of optimization parameters. The parameters of the set of selected geometric parameters are used as parameters of the selected profile model. The selected profile model is tested against one or more termination criteria.
Inventors:
Bow
Drezie, Emmanuel
Bao, Junway
Dodi, Srinivas
Niu, Shinhui
Jakatdal, Nick Hill
Drezie, Emmanuel
Bao, Junway
Dodi, Srinivas
Niu, Shinhui
Jakatdal, Nick Hill
Application Number:
JP2004526155A
Publication Date:
November 10, 2005
Filing Date:
July 25, 2003
Export Citation:
Assignee:
Timber Technologies, Inc.
International Classes:
G01B11/00; G01B11/02; G01B11/04; G01B11/08; G01B11/06; G01B11/14; G01B11/22; G01B11/28; G01N21/00; G01N21/41; G06F15/00; G06F19/00; H01L21/66; G06F; (IPC1-7): H01L21/66; G01B11/06; G01N21/00; G01N21/41
Domestic Patent References:
| JP2004509341A | 2004-03-25 |
Foreign References:
| WO2002023231A2 | 2002-03-21 |
Attorney, Agent or Firm:
Atsushi Aoki
Jun Tsuruta
Tetsuro Shimada
Tsutomu Kono
Shimichi Akihisa
Masaya Nishiyama
Jun Tsuruta
Tetsuro Shimada
Tsutomu Kono
Shimichi Akihisa
Masaya Nishiyama