Title:
SELECTIVE FORMATION OF SILICON DIOXIDE FILM ON MOLDED ARTICLE OF PLASTIC
Document Type and Number:
Japanese Patent JPH04149249
Kind Code:
A
Abstract:
PURPOSE:To selectively form a silicon dioxide film on arbitrary part by coating part of the surface of molded article of plastic with an organosilicon compound (hydrolyzate), curing the compound and then bringing the molded article into contact with an aqueous solution of hydrosilicofluoric acid having specific concentration. CONSTITUTION:Part of the surface of molded article of plastic is coated with an organosilicon compound (hydrolyzate) shown by formula I (R<1> is 1-6C hydrocarbon, vinyl, etc.; R<2> is alkoxy, etc.; (m) is 0 or 1) in a given shape and the compound is cured. The surface except the coated part is irradiated with ultraviolet rays or far ultraviolet rays, the molded article is brought into contact with an aqueous solution of hydrosilicofluoric acid having >=2.5mol/l concentration in a supersaturated state of silicon dioxide to form a silicon dioxide film only on the part coated with the silicon compound (hydrolyzate). Optionally, part to be coated with the organosilicon compound (hydrolyzate) is previously coated with a silyl peroxide compound shown by formula II (R<3> is 1-6C hydrocarbon, vinyl, etc.; R<4> is alkyl, etc.; (n) is 0-3).
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Inventors:
KITAOKA MASAKI
HONDA HISAO
YOSHIDA HARUNOBU
HONDA HISAO
YOSHIDA HARUNOBU
Application Number:
JP27423990A
Publication Date:
May 22, 1992
Filing Date:
October 13, 1990
Export Citation:
Assignee:
NIPPON SHEET GLASS CO LTD
International Classes:
C08J7/04; B05D7/02; B32B27/00; (IPC1-7): B05D7/02; B32B27/00; C08J7/04
Attorney, Agent or Firm:
Ohno Seiichi
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