Title:
自己形成型上部反射防止コーティング組成物、それを含むフォトレジスト混合物およびそれを用いた像形成する方法
Document Type and Number:
Japanese Patent JP5739408
Kind Code:
B2
Abstract:
A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.
Inventors:
Juan, Woo Sung
Popova, Irene
Varanasi, Pushkara, Lao
Viklikey, Levoa
Popova, Irene
Varanasi, Pushkara, Lao
Viklikey, Levoa
Application Number:
JP2012502194A
Publication Date:
June 24, 2015
Filing Date:
March 24, 2010
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION
International Classes:
G03F7/004; C08F212/34; C08F220/02; G03F7/039; G03F7/11
Domestic Patent References:
| JP2008239646A | ||||
| JP2008203452A | ||||
| JP2007316188A | ||||
| JP2008003592A | ||||
| JP2008257166A |
Foreign References:
| WO2007042348A1 | ||||
| US20030228537 | ||||
| EP1970760A1 |
Attorney, Agent or Firm:
Takeshi Ueno
Tasaichi Tanae
Yoshihiro City
Tasaichi Tanae
Yoshihiro City