Title:
SELF-INITIATING PHOTOPOLYMERIZABLE PHOTOSENSITIVE RESIN, PHOTOSENSITIVE RESIN COMPOSITION USING IT AND ITS CURED PRODUCT
Document Type and Number:
Japanese Patent JP2004107590
Kind Code:
A
Abstract:
To provide a novel self-initiating photopolymerizable photosensitive resin that is incorporated into a polymer chain resulting from the polymerization reaction and does not generate a volatile/sublimation product from a cured film thereof.
The self-initiating photopolymerizable photosensitive resin (A) is a reaction product of (a) an epoxy compound having two or more epoxy groups in the molecule with (b) a monocarboxylic acid having an ethylenically unsaturated group in the molecule and a thioxanthone carboxylic acid.
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Inventors:
KOYANAGI TAKAO
Application Number:
JP2002275685A
Publication Date:
April 08, 2004
Filing Date:
September 20, 2002
Export Citation:
Assignee:
NIPPON KAYAKU KK
International Classes:
C08F290/06; C08G59/16; (IPC1-7): C08G59/16; C08F290/06