To provide a semiconductor device that reduces backward leakage current while comparatively maintaining forward characteristics in forward behavior.
The semiconductor device 1 (horizontal SBD) includes: a nitride based semiconductor functional layer 2 having a second nitride based semiconductor region 22 functioning as a barrier layer on a first nitride based semiconductor region 21 on which a two-dimensional carrier gas layer 23 is formed; a first main electrode 3 electrically connected to one end of the two-dimensional carrier gas layer 23; a second main electrode 4 electrically connected to the other end of the two-dimensional carrier gas layer 23; and a metal oxide film 6 which is disposed between the first main electrode 3 and second main electrode 4 and electrically connected to the first main electrode 3 so as to reduce the carrier density of the two-dimensional carrier gas layer 23.
IWAGAMI SHINICHI
JP2007048783A | 2007-02-22 | |||
JP2006135241A | 2006-05-25 | |||
JP2008034438A | 2008-02-14 | |||
JP2005317843A | 2005-11-10 | |||
JP2008108870A | 2008-05-08 |
Iwa Saki Kokuni
Kawamata Sumio
Masakazu Ito
Shunichi Takahashi
Toshio Takamatsu
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