Title:
半導体装置とその製造方法、及び露光用マスク
Document Type and Number:
Japanese Patent JP5326282
Kind Code:
B2
Inventors:
Koichi Nagai
Junichi Watanabe
Junichi Watanabe
Application Number:
JP2008003117A
Publication Date:
October 30, 2013
Filing Date:
January 10, 2008
Export Citation:
Assignee:
Fujitsu Semiconductor Limited
International Classes:
H01L21/027; G03F1/42; G03F1/44; G03F7/20; H01L21/301
Domestic Patent References:
| JP2002093750A | ||||
| JP2001305717A | ||||
| JP2002158159A | ||||
| JP9320936A | ||||
| JP2127641A | ||||
| JP2007049067A |
Attorney, Agent or Firm:
Keizo Okamoto