PURPOSE: To provide the sheet type film forming device by sputtering capable of forming good films without adhesion of impurities on film forming surfaces and a target.
CONSTITUTION: This sheet type film forming device by sputtering is composed of a vacuum chamber 1 which constitutes a regular polygonal cylinder, a film forming chamber 20 which has apertures 3 disposed on respective perpendicular side walls 2 of this vacuum chamber, opening/closing sluice valves 12 disposed at least at one of these apertures, independent gas introducing systems and vacuum discharge systems disposed on the outer side of the adjacent apertures exclusive of at least these apertures and shutters 26 for opening and closing the apertures, a turn table 50 which is disposed within the vacuum chamber and rotates at the same pitch as the pitch of the apertures 3 and plural substrate holding arms 60 which are advanceably and retreatably disposed to face the respective apertures on this turn table, have mounting parts 65 to be vertically mounted with substrates W on their front ends, advance to come into pressurized contact with the apertures 3 and position the substrate mounting parts within the apertures 3.
KISODA KINYA
TOUCHI HACHIRO
| JPS6337186A | 1988-02-17 |