Title:
SHIFT MASK AND METHOD FOR FABRICATING MICRO-STRUCTURE
Document Type and Number:
Japanese Patent JP3875986
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for reproducing an image from a master with extremely high resolution, e.g. 0.1 μm, and with high fidelity and for making a data recording medium having high capacity.
SOLUTION: A polymer solution is spin-coated onto a master data recording disk such as a glass substrate with photoresist images before separating. After drying and forming a polymer, a polymer membrane results which is a faithful reproduction of micron-sized optical recording features on the surface of the master. Such membrane is either peeled-off and mounted to a pellicle-like frame or first laminated to a stiffer and stronger substrate before peeling to support the duplicate.
Inventors:
Gilbert H. Hong
Application Number:
JP2005156723A
Publication Date:
January 31, 2007
Filing Date:
May 30, 2005
Export Citation:
Assignee:
Gilbert H. Hong
International Classes:
B29C41/12; B29C37/00; B29C41/04; B29D17/00; B81C99/00; G03F1/00; G03F1/34; G03F1/60; G11B7/26; B29L17/00; (IPC1-7): G03F1/08; B29C41/12; B81C5/00; G11B7/26
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Utamon Shoji
Hajime Asamura
Utamon Shoji
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